The co salicide process technology has been applied to cmos ulsi front end of line fabrication as a substitute for the ti salicide process in order to form thin co silicide films with low resistivity for cmos transistor active area several co salicide process technologies have been developed. Development of nickel silicide for integrated circuit technology by phuh do ms thesis i phu h do hereby grant pennission to the wallace memorial library of the rochester institute of technology to reproduce this document in whole or in part that any reproduction will not be for commercial use or profit phu h do march 23 2006 first m. Silicide technology for integrated circuits processing silicide technology for integrated circuits processing materials circuits and devices kindle edition by lih j chen lih j chen download it once and read it silicide technology for integrated circuits the iet november 20th 2018 this is the first book to provide guidance on the. This feature is not available right now please try again later
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